Apparatus and method for indirectly heating a gas

Details Apparatus and method for indirectly heating a gas Apparatus and method for indirectly heating a gas

1990-01-24

1992-11-10

Kummert, Lynn M.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including heat exchanger for reaction chamber or reactants...

126 91A, 122 14, 122 33, 422197, 422201, 422202, 431353, F27B 1300

Patent

active

051621045

ABSTRACT:
A stream of process gas is indirectly heated in an elongated reaction chamber (1) with a longitudinal axis, a first end (12) and a second end (13) and defined by an outside shell (2) and a thermally conductive inner wall (4). The inner wall defines at least one recess or cavity (3) which extends substantially between the first and second end of the chamber and parallel to the longitudinal axis thereof. A process feed line (6) and a product-gas discharge line (7) are provided at opposite ends (12, 13) of the chamber. A heat conductive and heat resistant barrier (8) which defines an interior space extends coaxially with the recess or cavity (3) substantially along the entire length of the inner wall (4) and forms an annular space (9) therewith. A hot flue gas feed line (10) and a flue gas discharge line (11) is provided at one end (13) of the chamber. The hot gas feed line (10) leads directly into the interior space of the barrier (8) and the annular space (9) is in fluid communication with the interior space of the barrier (8) at the end (12) of the chamber which is opposite to the location of the hot flue gas feed line (10).

REFERENCES:
patent: 1894768 (1933-01-01), Hechenbleikner
patent: 2029604 (1936-02-01), Bayer et al.
patent: 2078949 (1937-05-01), Houdry
patent: 2299122 (1942-10-01), Battin
patent: 2408282 (1946-09-01), Wolf
patent: 2594329 (1952-04-01), Mayhew
patent: 4750986 (1988-06-01), Pinto et al.

Affiliated with

Also associated with

Rating

Apparatus and method for indirectly heating a gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for indirectly heating a gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for indirectly heating a gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2291091