Measuring and testing – Vibration – By mechanical waves
Reexamination Certificate
2006-09-26
2006-09-26
Williams, Hezron (Department: 2856)
Measuring and testing
Vibration
By mechanical waves
C134S0570DL, C134S113000, C134S184000, C134S902000
Reexamination Certificate
active
07111517
ABSTRACT:
Apparatus and method are provided for in-situ measurement of vibrational energy applied to a wafer in a process bath of a vibrational cleaning system. The apparatus may be made up of a test wafer comprising an array of pressure sensing elements disposed thereon for monitoring power level variation of a time-varying pressure wave. The time-varying pressure wave is indicative of vibrational energy that would be applied to a wafer in the process bath in the position of the test wafer.
REFERENCES:
patent: 4962776 (1990-10-01), Liu et al.
patent: 5931173 (1999-08-01), Schiele
patent: 6109113 (2000-08-01), Chavan et al.
patent: 6420201 (2002-07-01), Webster
patent: 6445053 (2002-09-01), Cho
patent: 6450184 (2002-09-01), Azar
patent: 6557654 (2003-05-01), Murray
patent: 6629465 (2003-10-01), Maluf et al.
patent: 6691578 (2004-02-01), Puskas
patent: 55159121 (1980-12-01), None
Biondi Dennis P.
Deselms Bradley Curtis
Kerr Daniel Charles
Olds Alan R.
Russell William A.
Agere Systems Inc.
Duane Morris LLP
Miller Rose M.
Williams Hezron
LandOfFree
Apparatus and method for in-situ measuring of vibrational... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for in-situ measuring of vibrational..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for in-situ measuring of vibrational... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3607301