Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2008-09-23
2008-09-23
Lee, Hwa (Andrew) S (Department: 2886)
Optics: measuring and testing
By light interference
For dimensional measurement
C356S521000
Reexamination Certificate
active
11383328
ABSTRACT:
Apparatus and methods for in situ and ex situ measurements of spatial profiles of the modulus of the complex amplitude and intensity of flare generated by an optical system. The in situ and ex situ measurements comprise interferometric and non-interferometric measurements that use an array of diffraction sites simultaneously located in an object plane of the optical system to increase signals related to measured properties of flare in a conjugate image plane. The diffraction sites generate diffracted beams with randomized relative phases. In general, the interferometric profile measurements employ phase-shifting point-diffraction interferometry to generate a topographical interference signal and the non-interferometric measurements are based on flare related signals other than topographic interference signals. The topographical interference signal and flare related signals are generated by a detector either as an electrical interference signal or electrical flare related signals or as corresponding exposure induced changes in a recording medium.
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Lee Hwa (Andrew) S
Wilmer Cutler Pickering Hale & Dorr LLP
Zetetic Institute
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