Coating apparatus – Gas or vapor deposition – With treating means
Patent
1994-01-19
1996-10-15
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118723E, 156345, C23C 1600
Patent
active
055650368
ABSTRACT:
The invention provides apparatus and methods for improving systems that expose samples to reactive plasmas, and more particularly for igniting plasma within a process module. The systems are of the type which have an electrode pair and a radiofrequency generator connected to one electrode. Gas is injected between the electrodes where it is ionized and transformed into a plasma. The invention includes (i) ignition means for ionizing gas, e.g., silane, between electrodes which are separated by a small gap of less than approximately one centimeter; and (ii) a radiofrequency energy generator that preferably operates at high frequencies, e.g., 60 MHz, to transform molecules into plasma. Several embodiments of ignition means are taught by the invention, including: an electron source, an ultraviolet source, a second radiofrequency energy generator, and radioactive sources, among others. A process module constructed according to the invention, using high frequency energy and small electrode separations, has a high rate of deposition and a high production yield.
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Berrian Donald
Meiling Hans
Vanderpot John W.
Westendorp Han
Breneman R. Bruce
Chang Joni Y.
TEL America, Inc.
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