Apparatus and method for heat cleaning semiconductor material

Details Apparatus and method for heat cleaning semiconductor material Apparatus and method for heat cleaning semiconductor material

1988-12-23

1990-08-14

Albritton, C. L.

Electric heating

Metal heating

By arc

2191218, 21912174, B23K 2600

Patent

active

049489372

ABSTRACT:
An apparatus for heat cleaning a semiconductor material by producing a uniform thermal distribution in the area of the material being cleaned. In one arrangement a heater block is positioned between a lamp nad a photocathode. The semiconductor material layer of the photocathode is directed away from the lamp. The heater block absorbs the entire range of wavelengths radiated by the lamp but reradiates only long wavelengths to the photocathode. In another arrangement, a laser has its beam directed to a focusing and scanning system. The resultant beam is directed to a photocathode which is positioned with its semiconductive layer directed toward the beam.

REFERENCES:
patent: 4720621 (1988-01-01), Langen

Affiliated with

Also associated with

Rating

Apparatus and method for heat cleaning semiconductor material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for heat cleaning semiconductor material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for heat cleaning semiconductor material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-464299