Patent
1993-07-09
1994-11-29
Nguyen, Phu K.
G06F 1562
Patent
active
053697391
ABSTRACT:
In a computer graphics system, a method of generating a geometrically valid point sample mask corresponding to a pixel. A separate mask is generated for each edge of a polygon. These masks specify whether particular subsample points are within a half-plane defined by an edge of the polygon. This information is determined by examining the sign of vertical or horizontal distance metrics corresponding to those sample points. These separate masks are merged to form the final point sample mask. Thereby, the final point sample mask contains information specifying whether particular sample points reside within the polygon. This information is used in rendering the pixel for display by the computer graphics system.
REFERENCES:
patent: 4692468 (1990-10-01), Beauregard et al.
patent: 5268992 (1993-12-01), Sasaki
Nguyen Phu K.
Silicon Graphics Inc.
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