X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-05-02
2006-05-02
Church, Craig E. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
Reexamination Certificate
active
07039160
ABSTRACT:
In an apparatus and a method for generating monochromatic X-ray radiation, an X-ray source, a monochromator and a slit collimator are arranged relative to one another such that X-rays of a specific energy among the X-rays emanating from the X-ray source are reflected at the monochromator and emerge through the slit of the slit collimator as a fan-shaped beam of monochromatic X-radiation. For scanning an examination subject with the X-ray beam, the monochromator is adjustable relative to the X-ray source and the slit collimator such that the condition for the reflection angle required for the reflection of X-rays of the specific energy at the monochromator remains substantially satisfied during the adjustment, and essentially only X-rays of the specific energy pass through the slit of the slit collimator.
REFERENCES:
patent: 5596620 (1997-01-01), Canistraro et al.
patent: 5757882 (1998-05-01), Gutman
patent: 2003/0112923 (2003-06-01), Lange et al.
patent: 199 55 848 (2000-05-01), None
Church Craig E.
Schiff & Hardin LLP
Siemens Aktiengesellschaft
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