Apparatus and method for forming thin films

Details Apparatus and method for forming thin films Apparatus and method for forming thin films

1989-03-17

1992-01-07

Silverman, Stanley

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427294, 118723, 118728, 118729, B05D 306, C23C 1600

Patent

active

050790315

ABSTRACT:
An improved apparatus and method for depositing thin films on a substrate. The apparatus utilizes two types of energy input. A pair of electrodes are provided in a reaction chamber and supplied with first AC electric energy at 1 to 100 MHz for generating a plasma gas in a reaction chamber therebetween. The substrate is mounted on a substrate holder to which second electric energy is supplied.

REFERENCES:
patent: 4582720 (1988-04-01), Yamazaki
patent: 4844767 (1989-07-01), Okudaira et al.
patent: 4859490 (1989-08-01), Ikegaya et al.
patent: 4891330 (1990-01-01), Guka et al.
Sawabe et al., Growth of Diamond Films by Electron Assisted Chemical Vapor Deposition, 10/22/84.

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