Apparatus and method for forming alignment layer

Liquid crystal cells – elements and systems – Nominal manufacturing methods or post manufacturing...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C349S124000

Reexamination Certificate

active

07400376

ABSTRACT:
It is an object of the present invention to provide an apparatus and a method for forming an alignment layer to align the orientation direction of liquid crystals. In an apparatus10for forming an alignment layer according to the present invention, the shape of an edge32aof a mask12for forming a slit14is determined by integrating the orientation direction of liquid crystals. The liquid crystals can be uniformly oriented by the edge32ahaving such shape. This leads to the manufacturing of a liquid crystal display free from irregularity in brightness and color.

REFERENCES:
patent: 5486403 (1996-01-01), Ishitaka et al.
patent: 5567550 (1996-10-01), Smayling
patent: 5770826 (1998-06-01), Chaudhari et al.
patent: 6061114 (2000-05-01), Callegari et al.
patent: 6061115 (2000-05-01), Samant et al.
patent: 6124914 (2000-09-01), Chaudhari et al.
patent: 6313896 (2001-11-01), Samant et al.
patent: 6331381 (2001-12-01), Chaudhari et al.
patent: 6377326 (2002-04-01), Kuo et al.
patent: 6479218 (2002-11-01), Choi
patent: 2002/0001057 (2002-01-01), Chaudhari et al.
patent: 07-056172 (1995-03-01), None
patent: 09-244027 (1997-09-01), None
patent: 10-253962 (1998-09-01), None
patent: 11-160711 (1999-06-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for forming alignment layer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for forming alignment layer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for forming alignment layer will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2771942

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.