Apparatus and method for forming a fine pattern

Details Apparatus and method for forming a fine pattern Apparatus and method for forming a fine pattern

1992-05-20

1994-01-11

Hearn, Brian E.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156643, 118723E, 20429831, 20429802, H01L 2100

Patent

active

052777405

ABSTRACT:
A fine pattern forming apparatus includes an elastic wave generating device which is provided on the wall of a vacuum chamber. A fine pattern forming method involves formation of a fine pattern while an elastic wave is being applied to the vacuum chamber by the elastic wave generating device. Since the fine pattern is formed while the elastic wave is applied to the vacuum chamber the, uniformity of the plasma density and of the electron density is improved and attachment of reaction products to the vacuum chamber is prevented.

REFERENCES:
Shwartzman et al. "Megasonic Particle Removal From Solid-State Wafers", RCA Review, vol. 46, Mar. 1985, pp. 81-105.

Affiliated with

Also associated with

Rating

Apparatus and method for forming a fine pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for forming a fine pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for forming a fine pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1628531