X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1991-07-26
1993-05-11
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 85, 378 34, 378145, G06M 100
Patent
active
052107795
ABSTRACT:
A dislocation-free, composite-substance crystal having a lattice constant which decreases over the length of the crystal (38) convergently focuses beams of hard X-rays or gamma rays (11). A single-substance, dislocation-free crystal (34) collimates diffuse beams of hard X-rays or gamma rays and projects the collimated radiation (11') to the focusing crystal (38). A mask (36) is interposed between the collimating crystal (34) and the focusing crystal (38) causing the collimated radiation (11'') to carry an image of the mask (36). The focusing crystal (38) produces a convergent hard X-ray beam or gamma ray beam (11''') to focus a reduced image of the mask (36) upon the photosensitive layer (41) of a wafer (39). An example of a dislocation-free crystal having a lattice constant which decreases over its length (38) is a dislocation-free silicon-germanium crystal (20) wherein the proportion of germanium to silicon varies over the length of the crystal.
REFERENCES:
patent: 4429411 (1984-01-01), Smither
patent: 4987582 (1991-01-01), Webster et al.
patent: 5063586 (1991-11-01), Jewell et al.
Chang David B.
Lawrence Albert F.
Vali Victor
Denson-Low Wanda K.
Gudmestad Terje
Hughes Aircraft Company
Porta David P.
Sales Michael W.
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