Apparatus and method for fine alignment of a photomask to a semi

Details Apparatus and method for fine alignment of a photomask to a semi Apparatus and method for fine alignment of a photomask to a semi

1979-03-14

1981-05-05

Rosenberger, R. A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, 356400, G01B 902

Patent

active

042655420

ABSTRACT:
A method and apparatus are disclosed for fine aligning a photomask to a semiconductor using the interference and diffraction effects produced by coherent light impinging upon or passing through repetitive patterns on a photomask and a semiconductor. A plurality of photodetectors are employed to convert the interference information into phase dependent electrical signals that are used to control conventional X, Y and .theta. workpiece positioning mechanisms.

REFERENCES:
patent: 3726595 (1973-04-01), Matsumoto
patent: 3738753 (1973-06-01), Huntley
patent: 3811779 (1974-05-01), Jacobs et al.
patent: 4051367 (1977-09-01), Sayce et al.

Affiliated with

Also associated with

Rating

Apparatus and method for fine alignment of a photomask to a semi does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for fine alignment of a photomask to a semi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for fine alignment of a photomask to a semi will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-294130