Apparatus and method for exposure

Optics: measuring and testing – By alignment in lateral direction – With registration indicia

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356358, 250548, 250224, G03B 2710, G03B 2753, G01N 2186

Patent

active

054403979

ABSTRACT:
An exposure apparatus and an exposure method capable of performing high-precision superposition exposure by preventing the thermal deformation of a position measurement target, for controlling positioning of a moved member, from influencing the correction of an error in the positioning of the moved member. The exposure apparatus projects an image of a pattern, formed on a mask, onto a photosensitive substrate through a projection optical system. A stage, on which the photosensitive substrate is mounted, is movable in at least X-axis and Y-axis directions in an imaging plane of the projection optical system. Position measuring devices measure the position of the stage in each of the two directions and are disposed so that the Abbe error is substantially zero with respect to the position at which the substrate is exposed to the pattern image. A pattern detector is disposed on a measuring axis of the position measuring devices with respect to one of the two directions to optically detect an alignment pattern formed on the photosensitive substrate. A rotation measuring device measures the amount of rotation of a measurement target of the position measuring devices with respect to the X- and Y-axis directions, and a controller controls the position and the amount of rotation of the stage on the basis of the amount of rotation measured by the rotation measuring device, the positions measured by the position measuring devices, and information regarding the position of the pattern detected by the pattern detector.

REFERENCES:
patent: 4676630 (1987-06-01), Matsushita et al.
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4803524 (1989-02-01), Ohno et al.
patent: 4869481 (1989-09-01), Yabu et al.
patent: 4908656 (1990-03-01), Suwa et al.
patent: 5003342 (1991-03-01), Nishi

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for exposure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for exposure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for exposure will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-975444

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.