Apparatus and method for exposing a liquid panel by beam scannin

Details Apparatus and method for exposing a liquid panel by beam scannin Apparatus and method for exposing a liquid panel by beam scannin

1997-09-24

1999-11-09

Phan, James

Optical: systems and elements

Deflection using a moving element

Using a periodically moving element

359197, 359213, 359215, G02B 2608

Patent

active

059825260

ABSTRACT:
An energy application apparatus and a method to operate at high speed that makes high usage of light. An exposure apparatus includes a laser oscillator, an optical shutter, imaging lenses, a screen, a vertical deflecting device, a horizontal deflecting device, a vertical moving device, a liquid crystal panel, and a controller. A light beam emitted from the laser oscillator passes through the optical shutter when in its open position, and is directed by the imaging lens onto the slit or pattern on the screen. After passing through the slit, the light is gradually made to converge by the imaging lens and to enter the galvanomirror. The galvanomirror deflects the beam by a predetermined angle in the vertical direction, and the deflected beam enters the galvanomirror. The galvanomirror deflects the beam by a predetermined angle in the horizontal direction. Thereafter, the beam exposes a desired location of the liquid crystal panel located on the stage to form an image thereon.

REFERENCES:
patent: 5170270 (1992-12-01), Yamamoto et al.
patent: 5309273 (1994-05-01), Mori et al.
patent: 5390044 (1995-02-01), Ito et al.
patent: 5608563 (1997-03-01), Matsumura et al.

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