Apparatus and method for exposing a liquid crystal panel by beam

Details Apparatus and method for exposing a liquid crystal panel by beam Apparatus and method for exposing a liquid crystal panel by beam

1996-02-07

1998-11-10

Phan, James

Optical: systems and elements

Deflection using a moving element

Using a periodically moving element

359202, 359212, 359214, G02B 2608

Patent

active

058352490

ABSTRACT:
An energy application apparatus and a method to operate at high speed that makes high usage of light. An exposure apparatus includes a laser oscillator, an optical shutter, imaging lenses, a screen, a vertical deflecting device, a horizontal deflecting device, a vertical moving device, a liquid crystal panel, and a controller. A light beam emitted from the laser oscillator passes through the optical shutter when in its open position, and is directed by the imaging lens onto the slit or pattern on the screen. After passing through the slit, the light is gradually made to converge by the imaging lens and to enter the galvanomirror. The galvanomirror deflects the beam by a predetermined angle in the vertical direction, and the deflected beam enters the galvanomirror. The galvanomirror deflects the beam by a predetermined angle in the horizontal direction. Thereafter, the beam exposes a desired location of the liquid crystal panel located on the stage to form an image thereon.

REFERENCES:
patent: 4070089 (1978-01-01), Grafton
patent: 4307930 (1981-12-01), Saito
patent: 5309273 (1994-05-01), Mori et al.

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