Chemistry: analytical and immunological testing – Measurement of electrical or magnetic property or thermal... – By means of a solid body in contact with a fluid
Patent
1996-06-04
1999-03-16
Warden, Jill
Chemistry: analytical and immunological testing
Measurement of electrical or magnetic property or thermal...
By means of a solid body in contact with a fluid
436149, 422 62, 422 8202, 422 98, 134 1, 134 2, G01N 2704, G01N 2712
Patent
active
058829385
ABSTRACT:
Apparatus and a method for evaluating the contamination over the surface of a substrate for use in manufacturing semiconductor devices, liquid crystal devices and so on, said contamination being caused by contaminants, for instance airborne organic substances or the equivalent in the clean room atmosphere. For evaluation, there is measured with passage of time in the atmosphere having a substantially constant relative humidity the surface resistivity (R) of the substrate 104 by bringing electrodes 106 into close contact with an insulating film as formed on said substrate surface, or a contact angle (.alpha.) of a liquid-drop 207 dropped on the substrate 206. From this measurement, the degree of said contamination is judged by comparing the value of the surface resistivity or contact angle as measured immediately after rinsing the substrate, with the values of the same as measured after exposing the substrate to the objective atmosphere to be evaluated.
REFERENCES:
patent: 3628137 (1971-12-01), Mazur
patent: 3644829 (1972-02-01), Chan et al.
patent: 3676775 (1972-07-01), Dupnock et al.
patent: 3890564 (1975-06-01), Wanatabe et al.
patent: 3947765 (1976-03-01), Diehl et al.
patent: 5260668 (1993-11-01), Mallory et al.
patent: 5491424 (1996-02-01), Asar et al.
patent: 5578504 (1996-11-01), Mitani et al.
Coles et al, CAS abstract 104:41855, 1985.
Allison et al, CAS abstract 121:159750, 1991.
Hideto Takahashi et al., Charge Leakage Characteristics of Glass Substrate for LCD, Prc. Inst. Electrostat Jpn., Apr. 18, 1994 (364-370).
Hideto Takahashi et al., Charge Leakage Characteristics of Glass Substrate for Liquid Crystal Display, Journal of Elctrostatics 35, 1995, (309-322).
Sakata Soichiro
Sato Katsumi
Takahashi Hideto
Markoff Alexander
Takasago Thermal Engineering Co., Ltd.
Warden Jill
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