Apparatus and method for enhancing fluid and gas flow in a well

Wells – Processes – Separating material entering well

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

166 53, E21B 4300

Patent

active

059379464

ABSTRACT:
An apparatus for enhancing fluid and gas flow in a recovery includes an upstream flow line communicably connected at one end to the well in a manner to receive fluid and gas therefrom, a fluid and gas separator communicably connected to another end of the upstream flow line in a manner to receive fluid and gas flow therefrom, a downstream sales flow line communicably connected to the fluid and gas separator in a manner to receive gas flow therefrom and having a restricted region therein, a pressure differential control operably disposed in the downstream sales line for comparatively sensing pressure differential in the downstream sales line about the restricted region, and a control valve operably disposed in the upstream flow line and operably controllably connected to the pressure differential control in a manner to permit regulated flow through the upstream flow line at a predetermined amount in response to the sensed pressure differential. A method is also provided.

REFERENCES:
patent: 3678997 (1972-07-01), Barchard
patent: 3863714 (1975-02-01), Watson, Jr.
patent: 4226284 (1980-10-01), Evans
patent: 5082492 (1992-01-01), Gallup et al.
patent: 5636693 (1997-06-01), Elmer

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for enhancing fluid and gas flow in a well does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for enhancing fluid and gas flow in a well, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for enhancing fluid and gas flow in a well will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-305523

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.