Optics: measuring and testing – By light interference – For dimensional measurement
Reexamination Certificate
2005-05-31
2005-05-31
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
By light interference
For dimensional measurement
C356S503000, C356S484000, C356S485000, C250S390060, C250S550000
Reexamination Certificate
active
06900900
ABSTRACT:
A high-resolution and high-speed film thickness and thickness uniformity measurement method is disclosed in this invention. The disclosed method includes a step a) of measuring a film thickness at a single point on the top surface of the substrate using an interferometry with a measuring light beam having a range of wavelengths. The method further includes a step b) of selecting an optimal wavelength from the range of wavelengths applied for measuring the film thickness at the single point. The method further includes a step c) of measuring reflection intensities by scanning over a plurality of points with a measuring light beam of the optimal wavelength over the top surface of the substrate. The method further includes a step d) of calculating a film thickness at the plurality of points applying the optimal-wavelength reflection intensities at the plurality of points over the top surface of the substrate.
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Grund Evan
McMillen James A.
Brown Khaled
Lin Bo-In
Process Diagnostics, Inc.
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