Apparatus and method for electrostatically depositing...

Gas separation: processes – Electric or electrostatic field – With addition of solid – gas – or vapor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C095S061000, C095S078000, C095S079000, C096S062000, C096S069000, C096S077000, C096S095000, C096S098000

Reexamination Certificate

active

11712149

ABSTRACT:
An apparatus useful for electrostatic deposition (ESD) of aerosol particles and methods of depositing the aerosol particles onto a substrate are disclosed. The ESD apparatus and the method of the present invention are useful for electrostatically depositing nanoparticles produced by gas-phase synthesis onto a substrate where the velocity of the flow of aerosol can be controlled.

REFERENCES:
patent: 1335758 (1920-04-01), Schmidt
patent: 3853750 (1974-12-01), Volsy
patent: 4038049 (1977-07-01), Melcher et al.
patent: 4239505 (1980-12-01), Drnevich
patent: 4251234 (1981-02-01), Chang
patent: 4892579 (1990-01-01), Hazelton
patent: 5041145 (1991-08-01), Kakinuma et al.
patent: 5288305 (1994-02-01), Gellert et al.
patent: 5348571 (1994-09-01), Weber
patent: 5391220 (1995-02-01), Patterson
patent: 5466279 (1995-11-01), Hattori et al.
patent: 5476538 (1995-12-01), Nishio et al.
patent: 5707428 (1998-01-01), Feldman et al.
patent: 5979185 (1999-11-01), Blackwell et al.
patent: 6260385 (2001-07-01), Sempolinski et al.
patent: 6312507 (2001-11-01), Taylor et al.
patent: 6487879 (2002-12-01), Blackwell et al.
patent: 6508982 (2003-01-01), Shoji
patent: 6635106 (2003-10-01), Katou et al.
patent: 6878930 (2005-04-01), Willoughby et al.
patent: 6923979 (2005-08-01), Fotland et al.
patent: 7112236 (2006-09-01), Hoverson et al.
patent: 2002/0085977 (2002-07-01), Fotland et al.
patent: 2003/0136153 (2003-07-01), Marley et al.
patent: 2004/0187525 (2004-09-01), Coffey et al.
patent: 2004/0206127 (2004-10-01), Coffey et al.
patent: 2005/0100666 (2005-05-01), Hampden-Smith et al.
patent: 2005/0120752 (2005-06-01), Brown et al.
patent: 2005/0147752 (2005-07-01), Kodas et al.
patent: 2005/0223899 (2005-10-01), Kulmala et al.
patent: 53-128078 (1978-11-01), None
patent: WO00/61282 (2000-10-01), None
patent: WO01/16376 (2001-03-01), None
Corning Incorporated Application entitled “Apparatus For Particle Synthesis” filed Aug. 10, 2006.
Corning Incorporated Application entitled “System and Method for Electrostatically Depositing particles”, filed Feb. 28, 2007.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for electrostatically depositing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for electrostatically depositing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for electrostatically depositing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3929272

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.