Wave transmission lines and networks – Automatically controlled systems – Impedance matching
Patent
1994-02-03
1995-06-13
Gensler, Paul
Wave transmission lines and networks
Automatically controlled systems
Impedance matching
334 12, H03H 740
Patent
active
054246911
ABSTRACT:
An apparatus for dynamically matching a radio-frequency source for semiconductor processing to a load, and particularly adapted for plasma sputtering and etching processes, comprises an admittance matching network utilizing magnetically saturable inductors. A dc bias signal is provided to optimize the operating point of the saturable reactor with respect to the hysteresis characteristic of the core material. A control signal characterized by a phase error and a magnitude derived from the signal reflected from the load is applied to control the magnetizing current flowing through the inductors. The invention discloses a structure for the inductors which provides efficient coupling of the control current, while inherently rejecting rf currents reflected back from the load to the inductor current source.
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