Apparatus and method for electrical measurement of semiconductor

Details Apparatus and method for electrical measurement of semiconductor Apparatus and method for electrical measurement of semiconductor

1995-06-02

1996-04-02

Wieder, Kenneth A.

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

Of individual circuit component or element

439482, 437 8, G01R 100, G01R 104

Patent

active

055044379

ABSTRACT:
A stage 130 includes a metal base and an anti-metal contamination film formed on the metal base a semi-conductor wafer 120. The anti-metal contamination film is constructed of a material selected from the group consisting of a semi-conductor film, a semi-conductor oxide film, a semi-conductor nitride film, a semi-conductor carbide film, and a polytetrafluoroethylene film. The rear face of the semi-conductor wafer 120 mounted on the stage 130 is in direct contact with the anti-metal contamination film but not with the metal surface. The anti-metal contamination film, which does not contain simple substances of metals, effectively protects the rear face of the semi-conductor wafer 120 from contamination metal.

REFERENCES:
patent: 5034685 (1991-01-01), Leedy
patent: 5177438 (1993-01-01), Littlebury et al.
patent: 5434513 (1995-01-01), Fujii et al.

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