Apparatus and method for drying under reduced pressure, and...

Details Apparatus and method for drying under reduced pressure, and... Apparatus and method for drying under reduced pressure, and...

2005-11-22

2005-11-22

Edwards, Laura (Department: 1734)

Coating apparatus

Control means responsive to a randomly occurring sensed...

C118S684000, C118S696000, C118S699000, C118S050000, C034S092000, C034S403000, C034S406000

Reexamination Certificate

active

06966949

ABSTRACT:
In drying a coating liquid such as a resist applied to a substrate under reduced pressure, a coating film in a peripheral portion tends to lose good shape regardless of duration of a drying period, and it is difficult to set an appropriate exhaust flow rate. After the substrate is loaded in an airtight container, a pressure is reduced from atmospheric pressure to a pressure slightly higher than the vapor pressure of a solvent, for example. Then, the solvent actively evaporates from the coating liquid. Here, evacuation is performed initially based on a first flow rate set value Q1, and thereafter, it is performed based on a second flow rate set value larger than Q1. Rounding of the surface in the peripheral portion is corrected by evacuation based on Q1, and more active evaporation of a solvent component is attained by switching to Q2.

REFERENCES:
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patent: 6364953 (2002-04-01), Kawakami et al.
patent: 6443641 (2002-09-01), Takamori et al.
patent: 6473995 (2002-11-01), Miyakawa et al.

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