Apparatus and method for drying substrates

Details Apparatus and method for drying substrates Apparatus and method for drying substrates

1997-02-28

1999-08-24

Bennett, Henry A.

Drying and gas or vapor contact with solids

Process

Gas or vapor contact with treated material

34 78, F26B 300

Patent

active

059409851

ABSTRACT:
A substrate drying device including a process chamber, a transferring device for transferring a substrate to/from the process chamber, a solvent vapor generating chamber having a container for receiving liquid organic solvent and a heater for heating the liquid organic solvent of the container to generate vapor of the organic solvent, a solvent supply unit for supplying the liquid organic solvent in the container, a first passage, communicating with the solvent vapor generating chamber and the process chamber, for passing vapor of the organic solvent, a second passage, communicating with the container of the solvent vapor generating chamber and the solvent supply unit, for passing liquid organic solvent, a flow rate controller for controlling flow rate of the liquid organic solvent to be supplied to the solvent vapor generating chamber from the solvent supply unit, and a control device for detecting a state of organic solvent of at least one of the solvent supply unit, the solvent vapor generating chamber, and the process chamber to control an operation of the flow rate controller based on the detected state of organic solvent.

REFERENCES:
patent: 5369891 (1994-12-01), Kamikawa
patent: 5371950 (1994-12-01), Schumacher
patent: 5443540 (1995-08-01), Kamikawa

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