Drying and gas or vapor contact with solids – Process – Gas or vapor pressure varies during treatment
Patent
1999-05-15
2000-10-10
Gravini, Stephen
Drying and gas or vapor contact with solids
Process
Gas or vapor pressure varies during treatment
34409, 34 74, 34 77, 134 2, F26B 504
Patent
active
061288306
ABSTRACT:
Disclosed herein is an apparatus and method for drying solid articles such as semiconductor wafers. In one embodiment, the dryer comprises a process tank and a drying fluid supply system. The process tank includes a plurality spray nozzles to spray a non-flammable drying fluid to wet surfaces of the article for drying without the necessity of heat or other external means. The drying fluid comprises a non-flammable, environmentally compatible, and a non-hazardous fluid including a drying agent of (hydrofluoroether) HFE and a surfactant of isopropyl alcohol (IPA). Even without the benefit of heating, little if any solution or static charge remains after drying. The drying apparatus includes a drying fluid supply system for providing the drying fluid to the plurality of spray nozzles.
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Bettcher Dean
Kubinski Christopher
Bettcher Dean
Chaikin Douglas A.
Gravini Stephen
Kubinski Christopher
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