Apparatus and method for drying a semiconductor member

Drying and gas or vapor contact with solids – Process – With contacting of material treated with solid or liquid agent

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Details

34469, 34470, 34471, 34 75, 34 78, 134108, 134902, F26B 300

Patent

active

06101737&

ABSTRACT:
A drying apparatus and method of drying is provided for drying a semiconductor member mounted in a carrier that is placed in a processing tank through contact with isopropyl alcohol. An isopropyl alcohol liquid is vaporized in a bottom portion of the processing tank, and the resulting vapor is condensed in its top portion. A heater is disposed so as to heat the inside of the processing tank to keep the inside at a predetermined temperature range in a middle-layer portion, i.e., a drying portion, of the processing tank. The heater is covered with a heat insulating member.

REFERENCES:
patent: 5371950 (1994-12-01), Schumacher
patent: 5539995 (1996-07-01), Bran
patent: 5954911 (1999-09-01), Bergman et al.

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