Drying and gas or vapor contact with solids – Process – With contacting of material treated with solid or liquid agent
Patent
1998-08-12
2000-08-15
Wilson, Pamela A.
Drying and gas or vapor contact with solids
Process
With contacting of material treated with solid or liquid agent
34469, 34470, 34471, 34 75, 34 78, 134108, 134902, F26B 300
Patent
active
06101737&
ABSTRACT:
A drying apparatus and method of drying is provided for drying a semiconductor member mounted in a carrier that is placed in a processing tank through contact with isopropyl alcohol. An isopropyl alcohol liquid is vaporized in a bottom portion of the processing tank, and the resulting vapor is condensed in its top portion. A heater is disposed so as to heat the inside of the processing tank to keep the inside at a predetermined temperature range in a middle-layer portion, i.e., a drying portion, of the processing tank. The heater is covered with a heat insulating member.
REFERENCES:
patent: 5371950 (1994-12-01), Schumacher
patent: 5539995 (1996-07-01), Bran
patent: 5954911 (1999-09-01), Bergman et al.
Mitsubishi Denki & Kabushiki Kaisha
Ryoden Semiconductor System Engineering Corporation
Wilson Pamela A.
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