Apparatus and method for determining deviation of mask-to-facepl

Details Apparatus and method for determining deviation of mask-to-facepl Apparatus and method for determining deviation of mask-to-facepl

1978-10-23

1980-03-04

Lazarus, Richard B.

Metal working

Barrier layer or semiconductor device making

Barrier layer device making

29 2519, H01J 918

Patent

active

041909364

ABSTRACT:
Apparatus and method are provided for determining the deviation in mask-to-faceplate spacing from a desired spacing during cathode-ray tube construction. The apparatus utilizes the novel method which comprises the steps of sensing the position of the interior surface of a faceplate without a shadow mask being mounted adjacent the faceplate, mounting a shadow mask adjacent the faceplate and sensing the position of a side of the shadow mask opposite the faceplate. The difference in the two second positions minus the shadow mask thickness is the deviation in the desired mask-to-faceplate spacing.

REFERENCES:
patent: 3482286 (1969-12-01), Fassett et al.

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