Apparatus and method for detecting residual organic compounds

Radiant energy – Luminophor irradiation – With ultraviolet source

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2504581, G01M 1100

Patent

active

048002828

ABSTRACT:
In order to effectively detect unwanted residual organic compounds such as photoresist pieces left on a semiconductor substrate after a photolithography step during its fabrication process, the substrate surface is irradiated by an ultraviolet light beam and the fluorescent light emitted by the residual organic compounds is detected by a light-receiving element and converted into an electrical signal.

REFERENCES:
patent: 4087685 (1978-05-01), Froot
patent: 4608494 (1986-08-01), Kobayashi et al.
Dyer et al., "Vidicon Micro. for . . . Fluorescent Particles", Rev. of Sci. Instru., vol. 42, No. 4, (1971), p. 508.

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