Apparatus and method for detecting defects and dust on a pattern

Details Apparatus and method for detecting defects and dust on a pattern Apparatus and method for detecting defects and dust on a pattern

1982-07-19

1986-07-08

Willis, Davis L.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

250572, G01N 2189

Patent

active

045989974

ABSTRACT:
Apparatus for detecting defects and dust on patterned surfaces, such as patterned wafers, or grooved video disks, utilizes a scanning laser that provides light scattered by defects and dust. The scattered light is detected substantially free of diffracted beams from the pattern by a mask having apertures arranged to pass to the detector only scattered light and to block diffracted light and specular reflections.

REFERENCES:
patent: 4030835 (1977-06-01), Firester et al.
patent: 4197011 (1980-04-01), Hudson
patent: 4202627 (1980-05-01), Suzki et al.
patent: 4314763 (1982-02-01), Steigmeier et al.
patent: 4391524 (1983-07-01), Steigmeier et al.
patent: 4423331 (1983-12-01), Koizumi et al.

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