Chemistry: electrical and wave energy – Apparatus – Electrophoretic or electro-osmotic apparatus
Reexamination Certificate
2006-12-12
2006-12-12
Mayekar, Kishor (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Electrophoretic or electro-osmotic apparatus
C204S626000
Reexamination Certificate
active
07147765
ABSTRACT:
The present invention provides a system that enables the use of electrophoretic resists in the microfabrication industry for the production of microelectronic devices and is of sufficiently high quality to be used as a replacement for, or supplement to, current photoresist deposition technology. This system enables the application of electrophoretic resists in automated equipment that meets the standards for cleanliness and production throughput desired by the microelectronic fabrication industry. The system, apparatus and method, for providing electrophoretic resist (“EPR”) layers on microelectronic workpieces for the microfabrication of microelectronic devices comprises a deposition station for receiving a microelectronic workpiece and depositing a layer of electrophoretic photoresist (EPR) thereon, a workpiece handling apparatus, and a control unit coupled to the workpiece handling apparatus and the deposition station for coordinating the processing of the workpiece in accordance with a predetermined sequence and set of processing parameters.
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PCT International Search Report for PCT/US02/28165, Applicant: Semitool, Inc., Dec. 10, 2002, 7 pgs.
European Search Report for EP 02 76 8797; Semitool, Inc.; dated Jan. 26, 2006; 2 pgs.
Hanson Kyle
Klocke John
Klarquist & Sparkman, LLP
Mayekar Kishor
Semitool Inc.
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