Radiant energy – Corona irradiation – Charging of objects
Patent
1997-12-31
2000-05-09
Nguyen, Kiet T.
Radiant energy
Corona irradiation
Charging of objects
250324, 361224, H01T 1904
Patent
active
060607092
ABSTRACT:
A conductive slit screen is placed between a corona gun and the surface of a semiconductor wafer. The charge deposited on the wafer by the gun is controlled by a potential applied to the screen. A chuck orients the wafer in close proximity to the screen. A desired charge is applied to the wafer by depositing alternating polarity corona charge until the potential of the wafer equals the potential of the screen.
REFERENCES:
patent: Re29918 (1979-02-01), Verkuil
patent: 3206674 (1965-09-01), Thuy et al.
patent: 3456109 (1969-07-01), Gawron
patent: 3748579 (1973-07-01), Henry et al.
patent: 3787876 (1974-01-01), Pressman et al.
patent: 4049343 (1977-09-01), Hermanson
patent: 4326165 (1982-04-01), Szedon
patent: 4542434 (1985-09-01), Gehlke et al.
patent: 4544887 (1985-10-01), Kamieniecki
patent: 4563642 (1986-01-01), Munakata et al.
patent: 4599558 (1986-07-01), Castellano, Jr. et al.
patent: 4663526 (1987-05-01), Kamieniecki
patent: 4704576 (1987-11-01), Tributsch et al.
patent: 4780680 (1988-10-01), Reuter et al.
patent: 4792680 (1988-12-01), Lang et al.
patent: 4800337 (1989-01-01), Cox et al.
patent: 4809127 (1989-02-01), Steinman et al.
patent: 4812756 (1989-03-01), Curtis et al.
patent: 4816755 (1989-03-01), Look et al.
patent: 4827212 (1989-05-01), Kamieniecki
patent: 4827371 (1989-05-01), Yost
patent: 4873436 (1989-10-01), Kamieniecki et al.
patent: 4891584 (1990-01-01), Kamieniecki et al.
patent: 4901194 (1990-02-01), Steinman et al.
patent: 4951172 (1990-08-01), Steinman et al.
patent: 4956603 (1990-09-01), Russo
patent: 5025145 (1991-06-01), Lagowski
patent: 5055963 (1991-10-01), Partridge
patent: 5087876 (1992-02-01), Reiss et al.
patent: 5091691 (1992-02-01), Kamieniecki et al.
patent: 5202018 (1993-04-01), Horanyl et al.
patent: 5216362 (1993-06-01), Verkuil
patent: 5266892 (1993-11-01), Kimura
patent: 5343293 (1994-08-01), Berger et al.
patent: 5406214 (1995-04-01), Boda et al.
patent: 5453703 (1995-09-01), Goldfarb
patent: 5498972 (1996-03-01), Haulin
patent: 5498974 (1996-03-01), Verkuil et al.
patent: 5594247 (1997-01-01), Verkuil et al.
Outside Electrochemical Society Publication, 1985, Abstract No. 284, pp. 415-416, 1985.
Semiconductor International, "A New Approach for Measuring Oxide Thickness," Tom G. Miller, Jul. 1995, Cahners Publishing Company, 2 Pages.
"COS Testing Combines Expanded Charge Monitoring Capabilities with Reduced Costs", Michael A. Peters, Semiconductor Fabtech 95, 4 Pages. No Dated.
Process Monitoring, "Corona Oxide Semiconductor Test", Semiconductor Test Supplement, Feb./Mar. 1995, pp. S-3 and S-5.
"A Contactless Method for High-Sensitivity Measurement of p-n Junction Leakage," IBM J. RES. Develop., vol. 24, No. 3, May 1980.
"A Novel Contactless Method for Measuring Collector-Isolation P-N Junction Capacitance in LSI Wafers," Electrochemical Society Paper, R.L. Verkuil, 1981, (6 pgs).
John Bickley, "Quantox Non-Contact Oxide Monitoring System", A Keithley Technology Paper, 1995, 6 Pages.
Gregory S. Horner, Meindert Kleefstra, Tom G. Miller, Michael A. Peters, "Monitoring Electrically Active Contaminants to Assess Oxide Quality", Solid State Technology, Jun. 1995, 4 pages.
B. H. Yun, "Direct Measurement of Flat-Band Voltage in MOS by Infared Excitation", (Received May 25, 1972), pp. 194-195.
R. G. Vyverberg, "VII. Charging Photoconductive Surfaces", Xerography and Related Processes, pp. 201-206, 1973.
"Measuring Work Functions of `Dirty` Surfaces With a Vibrating Capacitive Probe", Langley Research Center, Hampton, Virginia. No Dated.
"Rechargable Magnesium Power Cells", Lyndon B. Johnson Space Center, Houston, Texas. No Dated.
R.B. Comizzoli, "Uses of Corona Discharges in the Semiconductor Industry", J. Electrochem. Soc.: Solid-State Science and Technology, Feb. 1987, pp. 424-429.
P. Edelman, "New Approach to Measuring Oxide Charge and Mobile Ion Concentration", Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing, SPIE vol. 2337, pp. 154-164. No Dated.
Horner Gregory S.
Miller Tom G.
Verkuil Roger L.
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