Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-05-17
2005-05-17
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S192120, C204S298230, C204S298090
Reexamination Certificate
active
06893544
ABSTRACT:
An in-line sputtering system for depositing a thin film on a substrate includes a buffer heating module, an entry transfer module adjacent to the buffer heating module and having an expedited conveyor device for moving the substrate therein and a first sputtering module for depositing the thin film on the substrate, which is adjacent to the entry transfer module. The entry transfer module serves as a buffer zone which mitigates fluctuations in temperature and pressure in the first sputtering module when the substrate is unloaded from the buffer heating module. The substrate in the entry transfer module is moved by the expedited conveyor device at a speed greater than that in the first sputtering module.
REFERENCES:
patent: 5116023 (1992-05-01), Contin
patent: 5244554 (1993-09-01), Yamagata et al.
patent: 6491802 (2002-12-01), Ishikawa et al.
Park Sung Wan
Song Hee Soo
Anderson Kill & Olick PC
Samsung Corning Co., Ltd.
Versteeg Steven
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