Apparatus and method for depositing coating onto porous substrat

Coating processes – Measuring – testing – or indicating

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Details

118692, 118712, 118715, 118728, 118732, 118733, 427255, 4272552, 4272553, C23C 1622

Patent

active

046095624

ABSTRACT:
Disclosed is an apparatus for forming a chemically vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of the substrate to react with a second gaseous reactant that is present on the other side of the substrate. The apparatus includes means for controlling the pressure and flow rate of each gaseous reactant, a manometer for measuring the difference in pressure between the gaseous reactants on each side of the substrate, and means for changing the difference in pressure between the gaseous reactants. Also disclosed is a method of detecting and closing cracks in the coating by reducing the pressure difference between the two gaseous reactants whenever the pressure difference falls suddenly after gradually rising, then again increasing the pressure difference on the two gases. The attack by the by-products of the reaction on the substrate are reduced by maintaining the flow rate of the first reactant through the pores of the substrate.

REFERENCES:
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patent: 4287224 (1981-09-01), Heimbach et al.
patent: 4371587 (1983-02-01), Peters
patent: 4374163 (1983-02-01), Isenberg
patent: 4466380 (1984-08-01), Jansen et al.
patent: 4487787 (1984-12-01), Shioya et al.
patent: 4501777 (1985-02-01), Rose
Isenberg, "Growth of Refractory Oxide Layers By Electrochemical Vapor Deposition (EVD) at Elevated Temperatures", pp. 572-583.

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