Apparatus and method for depositing borophosphosilicate glass on

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

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427563, 427564, 427562, 427567, C23C 1600

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active

059068612

ABSTRACT:
A borophosphosilicate glass is deposited on a substrate (50) by heating the substrate (50), and contacting the substrate with a mixture of the gases tetramethylcyclotetrasiloxane, trimethylborate, trimethylphosphite, and oxygen, without the presence of a carrier gas. The first three of the gases are produced from liquid sources by controlled vaporization and flow. The gases react at the heated substrate (50) to deposit the glass upon the substrate. In a reactor (52) for depositing the glass, the tetramethylcyclotetrasiloxane and trimethylborate are introduced at a gas inlet location (79), and the trimethylphosphite and oxygen are heated and introduced at another gas inlet location (90). The tetramethylcyclotetrasiloxane and trimethylborate mixture flows toward the location where the trimethylphosphite and oxygen are introduced, and whereat the gases are mixed. This gaseous mixture flows past the heated substrate (50) to deposit the glass thereon.

REFERENCES:
patent: 3481781 (1969-12-01), Kern
patent: 4105810 (1978-08-01), Yamazaki et al.
patent: 4546016 (1985-10-01), Kern
patent: 4557950 (1985-12-01), Foster et al.
patent: 4791005 (1988-12-01), Becker et al.
patent: 4801468 (1989-01-01), Ishihara et al.
patent: 4952524 (1990-08-01), Lee et al.
patent: 5028566 (1991-07-01), Lagendijk
patent: 5093149 (1992-03-01), Doehler et al.
Materials Research Society Symposium Proceedings, O'Meara et al., "The deposition of borophosphosilicate glass films by LPCVD using 2, 4, 6, 8 tetramethylcyclotetrasiloxane", Nov. 26-28, 1990, vol. 204, 1991, pp. 533-538, Boston MA.
Extended Abstracts, Becker et al. "TEOS-Borophosphosilicate glass (BPSG) and borosilicate glass (BSG) for trench applications", vol. 86, No. 2, pp. 394-395, Oct. 1986, Princeton NJ.
Journal of Vacuum Science and Technology: Part B.,Becker et al. "Process and film characterization of low pressure tetraethy lorthosilicate-borophosphosilicate glass", Jun. 1986, vol. 4, No. 3, pp. 732-744, New York NY.
Journal of the Electrochemical Society, Levy et al. "A new LPCVD technique of producing borophosphosilicate glass films by injection of miscible liquid precursors", vol. 134, No. 2, Feb. 1987, pp. 430-437, Manchester NH.
Microelectronic Manufacturing and Testing. Ferran et al., "Delivering low-vapor pressure materials to LPCVD processes", vol. 11, No. 10, pp. 26-29, Sep. 1988, U.S.A.
Hochberg, Dr. A., and Dr. B. Gelernt, User's Guide For: Undoped Glass, PSG, and BPSG Using TOMCATS.RTM. Source Material*, No Month Available 1991, Schumacher, Carlsbad, California 92009, 18 pages.

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