Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-05-27
2000-08-08
Lund, Jeffrie R
Coating apparatus
Gas or vapor deposition
With treating means
118728, 118500, 165 801, C23C 1600, F28F 700
Patent
active
060996528
ABSTRACT:
An apparatus for depositing synthetic diamond on a surface of a substrate includes a deposition chamber and a cooling block having a surface in the deposition chamber that is cooled by heat exchange. The substrate is supported from the cooling block so that the bottom surface of the substrate is spaced from the cooling block surface by a gap, and a gas is provided in the deposition chamber and in the gap, the gas comprising at least 30 percent hydrogen gas. A plasma deposition system forms in the chamber a plasma containing hydrogen gas and a hydrocarbon gas for depositing synthetic diamond on the top surface of the substrate.
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Heuser Michael S.
Jaffe Stephen M.
Patten, Jr. Donald O.
Quirk William A.
Simpson Matthew A.
Lund Jeffrie R
Saint-Gobain Industrial Ceramics, Inc.
Ulbrich Volker R.
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