Apparatus and method for depositing a film on a substrate by che

Details Apparatus and method for depositing a film on a substrate by che Apparatus and method for depositing a film on a substrate by che

1997-06-05

2000-06-20

Bueker, Richard

Coating apparatus

Condition responsive control

118712, 118715, C23C 1600

Patent

active

060773553

ABSTRACT:
There is provided an apparatus for accomplishing chemical vapor deposition, including a reaction chamber in which a film is deposited on a substrate by chemical vapor deposition, a source supply for supplying source to the reaction chamber for accomplishing chemical vapor deposition, and a mass spectrograph for detecting a concentration of the source in the reaction chamber and transmitting an instruction signal based on detection to the source supply for controlling an amount of the source to be supplied to the reaction chamber. It was quite difficult to control an amount of solid or liquid source to be supplied to a chemical vapor deposition apparatus. The above mentioned apparatus makes it possible to accurately control an amount of solid or liquid source, resulting in uniformity in a film deposition rate and a film composition.

REFERENCES:
patent: 5540777 (1996-07-01), Barbee

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