Etching a substrate: processes – Nongaseous phase etching of substrate – Projecting etchant against a moving substrate or controlling...
Reexamination Certificate
2005-09-20
2005-09-20
Hassanzadeh, Parviz (Department: 1763)
Etching a substrate: processes
Nongaseous phase etching of substrate
Projecting etchant against a moving substrate or controlling...
Reexamination Certificate
active
06946082
ABSTRACT:
A system and method for at least partially demetallizing a metallized film that has a metallized side and an opposite support side. In one embodiment, the method includes rotating a heat transfer roller about an axis such that a surface of the heat transfer roller passes a heating region, a printing region and a contacting region in sequence during each rotation; heating the heat transfer roller to a first temperature; applying the film to a portion of the surface of the heated heat transfer roller with the metallized side of the film facing away from the surface of the heat transfer roller; transferring heat from the heated heat transfer roller to the film in the heating region; printing an etchant solution at a second temperature, which is lower than the first temperature, in a predetermined pattern on the metallized side of the film in the printing region, and subsequently transferring heat from the heated heat transfer roller to the film to demetallize the metallized side of the film according to the predetermined pattern in the contacting region.
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Cochran, Esq. Christine M.
Culbert Roberts
Hassanzadeh Parviz
Howrey LLP
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