Apparatus and method for delivering reagents in vapor form to a

Details Apparatus and method for delivering reagents in vapor form to a Apparatus and method for delivering reagents in vapor form to a

1994-01-07

1994-11-08

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

134 56R, 134115R, C23C 1600

Patent

active

053623282

ABSTRACT:
A means and method for protecting a source reagent vaporizer structure from the harmful effects of solid build-up occurring during its use in chemical vapor deposition (CVD). Vaporizer structures may be used to provide a means of transferring relatively involatile source reagents or reagent solutions into CVD reactors and often are high surface area, highly efficient heat transfer structures. When vaporizers are used in CVD, often some premature decomposition of the source reagent occurs on the vaporizer element as well as some oxidative decomposition to produce solid products which cause clogging and inefficient vaporization. The invention provides both apparatus and method to periodically flush clean such vaporizer elements to increase their consistency, reliability, and average time between servicings.

REFERENCES:
patent: 5204314 (1993-04-01), Kirlin

Affiliated with

Also associated with

Rating

Apparatus and method for delivering reagents in vapor form to a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for delivering reagents in vapor form to a , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for delivering reagents in vapor form to a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1779245