Apparatus and method for correcting for drift in production of o

Optics: measuring and testing – Lamp beam direction or pattern

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356375, 356398, 425174, 264 22, G01J 100

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active

050590219

ABSTRACT:
An apparatus and a method for correcting for drift in production of objects by stereolithography is disclosed. A beam sensor comprising a pinhole in a plate and a photodector behind the pinhole is used to obtain the apparent position of the beam at calibration time and subsequently. A comparison between the prior and present apparent position of the sensor is made in order to determine a drift error correction term to be used to compensate for drift and thereby improve the accuracy and pointing repeatability of the scanning mechanism.

REFERENCES:
patent: 4423437 (1983-12-01), Beck et al.
patent: 4541876 (1985-09-01), Hwang
patent: 4575330 (1986-03-01), Hull
patent: 4660981 (1987-04-01), Stridsberg
patent: 4695722 (1987-09-01), Motooka
patent: 4863538 (1989-09-01), Deckard
patent: 4929402 (1990-05-01), Hull

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