Apparatus and method for controlling vapor phase within an enclo

Dynamic magnetic information storage or retrieval – Record transport with head stationary during transducing – Disk record

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

360 9703, G11B 3314

Patent

active

052298990

ABSTRACT:
The vapor drain is a device that permits steady state control of the composition of the atmosphere within a substantially sealed enclosure. For any fabricated enclosure the will be sources of vapor phase molecules: molecules evaporating from a deliberately installed lubricant reservoir, molecules outgassed from components, and molecules diffusing in from the outside world. The purpose of the vapor drain is to minimize the second two classes of molecules in the composition of the enclosure atmosphere as they are considered to be contaminants. An example application is a rigid disk magnetic data storage device which requires a monomelecular layer of lubricant on the disk and slider surfaces. The vapor drains suppresses the contaminant population by capturing a portion of all three sources of molecules in the vapor phase. The vapor drain is a filter which has an active element of at least one of activated carbon, silica gel, activated alumina, synthetic zeolite, and other material with a large surface to volume ratio with the ability to adsorb vapor components from the atmosphere.

REFERENCES:
patent: 4789913 (1988-12-01), Gregory
Patent Abstracts of Japan--Publication No. 59218633 Entitled "Formation of Lubricating Film on Magnetic Disk Surface".
Patent Abstracts of Japan--Publication No. 62184685 Entitled "Magnetic Disc Device".
Patent Abstracts of Japan--Publication No. 01236423 Entitled "Magnetic Recording Medium".
Patent Abstracts of Japan--Publication No. 02199691 Entitled "Magnetic Disk Device".
Patent Abstracts of Japan--Publication No. 61148691 Entitled "Magnetic Disk Device".

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for controlling vapor phase within an enclo does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for controlling vapor phase within an enclo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for controlling vapor phase within an enclo will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1765316

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.