Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2007-08-20
2010-02-09
Nguyen, Kiet T (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S309000
Reexamination Certificate
active
07659526
ABSTRACT:
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
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A. Geraci et a
Bennahmias Mark Joseph
Mayse Mark Anthony
Scott Jeffrey Winfield
Zani Michael John
Knobbe Martens Olson & Bear LLP
NexGen Semi Holding, Inc.
Nguyen Kiet T
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