Apparatus and method for controlled particle beam manufacturing

Details Apparatus and method for controlled particle beam manufacturing Apparatus and method for controlled particle beam manufacturing

2007-08-20

2009-02-24

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S309000, C250S398000, C250S3960ML, C250S492100, C250S43200R, C250S397000, C250S252100, C250S491100, C204S192110, C204S216000, C430S005000

Reexamination Certificate

active

07495244

ABSTRACT:
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.

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