Apparatus and method for control, pumping and abatement for...

Details Apparatus and method for control, pumping and abatement for... Apparatus and method for control, pumping and abatement for...

2007-10-09

2007-10-09

Freay, Charles G (Department: 3746)

Pumps

Successive stages

Parallel stages to or from single stage

C417S313000, C118S050000, C118S715000, C118S719000

Reexamination Certificate

active

10750309

ABSTRACT:
The present invention is an apparatus and method for controlling pressure, pumping a vacuum and providing abatement for a plurality of vacuum processing chambers. The system may be used in semiconductor manufacture. Multiple vacuum processing chambers are exhausted by turbo pumps into a common abatement chamber, which is maintained at sub-atmospheric pressure by a backing pump. Pressure in the processing chambers is independently controlled. The internal volume of the abatement device provides a buffer that reduces the effect of pressure changes in one processing chamber affecting pressure in the other chambers.

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