Metallurgical apparatus – Means treating solid metal – By contact with gas
Patent
1976-06-18
1978-03-21
Dost, Gerald A.
Metallurgical apparatus
Means treating solid metal
By contact with gas
432260, C21D 954
Patent
active
040799212
ABSTRACT:
Apparatus and process are disclosed whereby open coils having spaces between the convolutions may be treated in a longitudinally extending furnace by passage of treating gases between the convolutions of the coils, the coils being introduced at one end of the furnace, passed through the furnace while being treated, and removed from the other end of the furnace. Walking beam apparatus is disclosed having sealing means, disclosed as a trough and flange sealing means that prevents gas leakage between the lower portion of the walking beam apparatus and the atmosphere, so that a completely gas sealed enclosure may be provided above the walking beams. Transfer means are disclosed at the entrance and discharge ends of the furnace, for introducing coils into the furnace and removing them from the furnace through purge chambers. A coil support that travels with the coil through the furnace is disclosed. Processes are also disclosed for continuously treating open coils.
REFERENCES:
patent: 2996293 (1961-08-01), Fallon
patent: 3063878 (1962-11-01), Wilson
patent: 3189336 (1965-06-01), Montagino
patent: 3446491 (1969-05-01), Espenschied et al.
patent: 3554505 (1971-01-01), Dessarts
patent: 3567195 (1971-03-01), Kakuta et al.
patent: 3716222 (1973-02-01), Anderson
patent: 3778221 (1973-12-01), Bloom
Dost Gerald A.
Lee Wilson Engineering Company, Inc.
LandOfFree
Apparatus and method for continuous treatment of metal coils or does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for continuous treatment of metal coils or , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for continuous treatment of metal coils or will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-567182