Apparatus and method for coating a substrate using vacuum arc ev

Details Apparatus and method for coating a substrate using vacuum arc ev Apparatus and method for coating a substrate using vacuum arc ev

1991-12-17

1993-12-14

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Vacuum arc discharge coating

20419238, C23C 1422

Patent

active

052698980

ABSTRACT:
An apparatus and method are described for depositing a coating onto a substrate using vacuum arc evaporation from a substantially cylindrical cathode. An axial magnetic field is disclosed to force the motion of the arc into an open helical trajectory on the cathode surface. Means are also provided for controlling the speed and direction of the arc along the cathode by varying the division of input current between the ends of the cathode. Improved uniformity of cathode erosion and coating thickness are thereby achieved, along with a reduction in the number and size of splattered droplets incorporated into the coating.

REFERENCES:
patent: 4492845 (1985-01-01), Kljuchko et al.
patent: 4673477 (1987-06-01), Ramalingam et al.
patent: 4724058 (1988-02-01), Morrison, Jr.
patent: 4849088 (1989-07-01), Veltrop
patent: 5037522 (1991-08-01), Vergason

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