Apparatus and method for closing a septal defect

Details Apparatus and method for closing a septal defect Apparatus and method for closing a septal defect

1998-12-22

2000-09-12

Buiz, Michael

Surgery

Instruments

Sutureless closure

606215, 606157, A61B 1708

Patent

active

06117159&

ABSTRACT:
A catheter delivered device to close a septal defect, the device comprising a cylindrical shaft of metal or polymeric material with concentric parallel cuts through the wall of the device which create flattened support struts. The center of the support struts move radially away from the axis in a hinge like fashion in response to the movement of the device's proximal and distal ends toward the center of the device. This movement is reversibly effected through mechanical means. The device can be coated with growth factors, mitogenic factors or other determinants which can improve tissue growth such that tissue ingrowth can occur over a period of time. The catheter itself may be an ultrasonic imaging catheter.

REFERENCES:
patent: 3874388 (1975-04-01), King et al.
patent: 4007743 (1977-02-01), Blake
patent: 4699611 (1987-10-01), Bowden
patent: 4710192 (1987-12-01), Liotta et al.
patent: 4836204 (1989-06-01), Landymore et al.
patent: 4917089 (1990-04-01), Sideris
patent: 5108420 (1992-04-01), Marks
patent: 5171259 (1992-12-01), Inoue
patent: 5192301 (1993-03-01), Kamiya et al.
patent: 5350399 (1994-09-01), Erlebacher et al.
patent: 5437288 (1995-08-01), Schwartz et al.
patent: 5634936 (1997-06-01), Linden et al.
patent: 5725553 (1998-03-01), Moenning
patent: 5861003 (1999-01-01), Latson et al.

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