Apparatus and method for cleaning wafers

Details Apparatus and method for cleaning wafers Apparatus and method for cleaning wafers

1977-12-19

1980-06-24

Moore, Christopher K.

Brushing, scrubbing, and general cleaning

Machines

With air blast or suction

15306B, 15308, 134 79, 134133, 211 41, A46B 1304

Patent

active

042087600

ABSTRACT:
Apparatus and method in which a number of thin, disc-like wafers are moved in an arcuate path while supported in a generally upright position. While so supported, the wafers are indexed between a plurality of cleaning stations which may include a scrub station, a scrub rinse station, a rinse station, and a dry station. In the scrub rinse and/or scrub station, the wafers are rotated while contacted on opposite surfaces thereof by a pair of rotating brushes disposed in a closed position, which brushes may be moved to an open position to accommodate movement of the wafers therebetween. Furthermore, a bracket of unique construction serially moves the wafers into the travel path. Means for introducing the wafers to the path and for removing them therefrom are further included.

REFERENCES:
patent: 3479222 (1969-11-01), David et al.
patent: 3585668 (1971-06-01), Jaccodine et al.
patent: 3641618 (1972-02-01), Rainey et al.
patent: 3748677 (1973-07-01), Frank et al.
patent: 3939514 (1976-02-01), Cook
patent: 3970471 (1976-07-01), Bankes et al.

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