Apparatus and method for cleaning semiconductor wafers

Details Apparatus and method for cleaning semiconductor wafers Apparatus and method for cleaning semiconductor wafers

1998-02-25

2000-11-14

Markoff, Alexander

Cleaning and liquid contact with solids

Processes

With treating fluid motion

134 21, 134 34, 134902, B08B 700, B08B 704

Patent

active

061464694

ABSTRACT:
The present invention relates to an apparatus and method for cleaning post-etch semiconductor wafers using ultra-pure dry steam.

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patent: 5314846 (1994-05-01), Boitnott
patent: 5735962 (1998-04-01), Hillman
patent: 5964952 (1999-10-01), Kunze-Concewitz

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