Apparatus and method for cleaning and drying semiconductors

Details Apparatus and method for cleaning and drying semiconductors Apparatus and method for cleaning and drying semiconductors

1976-09-23

1978-03-21

Camby, John J.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34 12, 34 60, 34 68, 219271, 134 11, 134 30, F26B 334

Patent

active

040795225

ABSTRACT:
A semiconductor wafer is cleansed of loose foreign surface matter and chemical impurities near the surface in an apparatus which passes superheated steam over the wafer. Condensate is permitted to form and drip off the wafer. After rising above 100.degree. C the wafer becomes dry, and is removed from the apparatus and then permitted to cool.

REFERENCES:
patent: 3717439 (1973-02-01), Sakai
patent: 3845270 (1974-10-01), Widugris

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