Apparatus and method for chemical vapor deposition of diamond

Details Apparatus and method for chemical vapor deposition of diamond Apparatus and method for chemical vapor deposition of diamond

1994-12-27

1995-08-01

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118729, C23C 1600

Patent

active

054377285

ABSTRACT:
Diamond is produced by chemical vapor deposition on a substrate by hot filament activation of a hydrogen-hydrocarbon gas mixture. An edge of the substrate faces the filament at a distance therefrom up to about 1 mm and preferably about 0.3-0.7 mm., and the substrate is moved relative to the filament to maintain this spacing as diamond forms thereon. Diamond formation proceeds at an improved rate, and in single crystal configuration under certain conditions.

REFERENCES:
patent: 4056208 (1977-11-01), Prejean
patent: 4816286 (1989-03-01), Hirose
patent: 4953499 (1990-09-01), Anthony et al.
Aikyo et al., "Diamond Synthesis Suppressing the Thermal Decomposition of Methane in a Hot-Filament CVD", Jpn. J. Appl. Phys. 28(9), Sep. 1989, pp. L1631-L1633.

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