Optics: measuring and testing – Lens or reflective image former testing
Reexamination Certificate
2008-05-27
2008-05-27
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Lens or reflective image former testing
C430S311000, C430S005000, C356S124500
Reexamination Certificate
active
11203331
ABSTRACT:
A system and method for characterizing an imaging system causes a diffraction image indicative of a test structure having a generalized line-grating to be formed and then extracts from a measurement of the diffraction image a lens transmittance function, a photoresist property or a defocus distance.
REFERENCES:
patent: 4110046 (1978-08-01), Baker et al.
patent: 5978085 (1999-11-01), Smith et al.
patent: 6011611 (2000-01-01), Nomura et al.
patent: 6130747 (2000-10-01), Nomura et al.
patent: 6314212 (2001-11-01), Womack et al.
patent: 6317198 (2001-11-01), Sato et al.
patent: 6356345 (2002-03-01), McArthur et al.
patent: 6573986 (2003-06-01), Smith et al.
patent: 6650399 (2003-11-01), Baselmans et al.
patent: 6674511 (2004-01-01), Nomura et al.
patent: 6693704 (2004-02-01), Ooki et al.
patent: 6741327 (2004-05-01), Nomura et al.
patent: 2002/0062206 (2002-05-01), Liebchen
patent: 2003/0006212 (2003-01-01), Segawa et al.
patent: 2004/0184030 (2004-09-01), Liebchen
patent: 2004/0224242 (2004-11-01), Izuha et al.
patent: 2006/0073686 (2006-04-01), Zach et al.
Sung, Jinwon, Mahesh Pitchumani, and Eric Johnson, “Aberration measurement of photolithographic lenses by use of hybrid diffractive photomasks,” Applied Optics, vol. 42, No. 11, Apr. 10, 2003.
Ward, A.J., Robbins, Reid, Whitbread, Busico, Williams, Duck, Childs, Carter, “Realization of Phase Grating Comb Reflectors and Their Application to Widely Tunable DBR Lasers,” IEEE Photonics Technology Letters, vol. 16, No. 11, Nov. 2004.
N. R. Farrar, et al., “In-situ measurement of lens aberrations,” (SPIE, vol. 4000, p. 18, 2000).
M. V. D. Kerkhof, et al., “Full optical column characterization of DUV lithographic projection tools,” (SPIE, vol. 5377, pp. 1960-1970, 2004).
P. E. Dirksen, et al., “Aberration retrieval using the extended Nijboer-Zemike approach,” J. Microlith. Microfab., Microsyst., vol. 2, p. 61, 2003.
P. Dirksen, et al., “Novel aberration monitor for optical lithography,” SPIE, vol. 3679, pp. 77-86, 1999.
Huang Hsu-Ting
Sezginer Abdurrahman
Invarium, Inc.
Sheppard Mullin Richter & Hampton LLP
Slomski Rebecca C
Toatley , Jr. Gregory J.
LandOfFree
Apparatus and method for characterizing an image system in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Apparatus and method for characterizing an image system in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for characterizing an image system in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3924196